Horizontal PECVD Furnace
SVCS Plasma Enhanced Chemical Vapor Deposition Furnaces
The design of the SVCS Plasma Enhanced Chemical Vapor Deposition furnaces combines multiple process capability with the needs of maximum capacity for full production systems (SVpFUR-FP) and high-flexibility small-scale versions for research and pilot production (SVpFUR-RD). It provides an easy-to-maintain, safe, and reliable horizontal furnace platform.
The SVCS design stands out for high efficiency, minimized footprint, and low cost of ownership while offering excellent process flexibility.
PECVD Processes
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Silicon nitride (including anti-reflective SiN solar cell coating)
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Silicon oxide
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Oxynitride
Features and Benefits
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State-of-the-art modular control system; in-house designed, highly tailored, and in-house manufactured
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Top-notch components always selected for excellent results and trouble-free, long life of the furnace equipment
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Up to 4 stacked quartz tube reactor chambers for various processes
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Multiple methods of vacuum control, heated or unheated
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Throttling Butterfly Valve (TBV)
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N₂ ballast
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Vacuum pump control with frequency converter
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Integration of vacuum pump systems in cooperation with leading vacuum pump manufacturers
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Advanced water cooling tube-level system: no thermal interference between different tubes
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On-request integration of RF generators in cooperation with leading manufacturers
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Proprietary-designed water-cooled flanges
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Proprietary in-house manufactured RF generators
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Proprietary-designed in-house assembled graphite wafer carriers
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Contactless, fully automated boat-in-tube loading cantilever with proprietary ceramic-encapsulated twin rod system
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Maintenance-friendly mechanical design