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Compact Tabletop Furnace

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Compact Tabletop Furnace

SVCS Tabletop Furnace System
The SVCS Tabletop Furnace system provides a semiconductor-grade quality tool for universities, R&D laboratories, and pilot fabs. This system supports a wide range of processes due to its outstanding flexibility and the number of optional modules available to meet the special-and often unique-requirements of each customer.

Processes

  • Gas, liquid, or solid-state source diffusion

  • Dry or wet oxidation + Trans-LC

  • Annealing (forming gas or nitrogen)

  • Sintering

  • Polyimide baking/curing

  • Atmospheric, LPCVD, PECVD

  • Silicon nitride

  • poly-Si, α-Si

  • TEOS, HTO, LTO

  • Graphene, CNTs, nanowires

Features

  • Atmospheric or vacuum design

  • Small footprint

  • Low power consumption

  • Easy operation and maintenance

  • Heating element with 1 or 3 temperature zones, max. temperature up to 1300 °C

  • Modern modular proprietary control system

  • Up to 8 gas lines and 2 liquid sources

  • Independent hardware safety interlocks

  • Integration of vacuum pump systems in cooperation with leading pump manufacturers

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