Compact Tabletop Furnace
SVCS Tabletop Furnace System
The SVCS Tabletop Furnace system provides a semiconductor-grade quality tool for universities, R&D laboratories, and pilot fabs. This system supports a wide range of processes due to its outstanding flexibility and the number of optional modules available to meet the special-and often unique-requirements of each customer.
Processes
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Gas, liquid, or solid-state source diffusion
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Dry or wet oxidation + Trans-LC
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Annealing (forming gas or nitrogen)
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Sintering
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Polyimide baking/curing
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Atmospheric, LPCVD, PECVD
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Silicon nitride
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poly-Si, α-Si
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TEOS, HTO, LTO
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Graphene, CNTs, nanowires
Features
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Atmospheric or vacuum design
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Small footprint
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Low power consumption
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Easy operation and maintenance
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Heating element with 1 or 3 temperature zones, max. temperature up to 1300 °C
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Modern modular proprietary control system
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Up to 8 gas lines and 2 liquid sources
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Independent hardware safety interlocks
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Integration of vacuum pump systems in cooperation with leading pump manufacturers