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Compact Tabletop Furnace

The SVCS Tabletop Furnace system provides a semiconductor grade quality tool for universities, R&D laboratories and pilot fabs. This system can be used for wide range of processes due to outstanding flexibility and amount of optional modules available to meet special and often unique requirements of every customer.

Processes

  • Gas, liquid or solid state source diffusion
  • Dry or Wet oxidation + Trans-LC
  • Annealing (forming gas or nitrogen)
  • Sintering
  • Polyimide baking/curing
  • Atmospheric, LPCVD, PECVD
  • Silicon Nitride
  • poly-Si, α-Si
  • TEOS, HTO, LTO
  • Graphene, CNTs, Nanowires

Features

  • Atmospheric or Vacuum design
  • Small footprint
  • Low power consumption
  • Easy operation and maintenance
  • Heating element with 1 or 3 temperature zones, max. temperature up to 1300 oC
  • Modern modular proprietary control system
  • Up to 8 gas lines and 2 liquid sources
  • Independent hardware safety interlocks
  • Integration of vacuum pump systems in cooperation with leading pump manufacturers

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