IPA Vapor Dryer
JST’s “CLV” Dryer utilizes patented, environmentally friendly, ultra-clean technology for precision drying of silicon wafers, III-V compound wafers, glass substrates, disk drives, optic lenses, and many other products.
JST’s CLV Dryer combines two proven drying technologies, vacuum drying and isopropyl alcohol (IPA) drying, employing the best features of both in an effective closed-loop process.
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Ultra-clean IPA vapor is remotely generated and introduced into a sealed drying chamber.
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This closed-loop system allows fresh IPA vapor to rinse and penetrate surface areas, absorbing moisture.
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A low-pressure vacuum then removes any remaining moisture from the chamber and product.
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Dry cycle time is 10 minutes using quartz low-profile cassettes with average IPA consumption of 66 cc per cycle.
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Drying is particle neutral down to 0.16.
At the end of the drying cycle, the chamber is backfilled with argon or nitrogen gas, ensuring the cleaned and dried product is removed into a virtually inert atmosphere.