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CMP Slurry Filtration Solution

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CMP Slurry Filtration Solution

CMP Polishing System Filters

Suitable for CMP polishing systems in slurry recirculation/global loop and at point-of-use (POU).

Features

  • Nano-fiber Media: Multi-layer nano-fiber media provides high flow rates and dirt holding capacity.

  • Patent on Filter Construction Design: Perfectly integrates depth, pleated, and rolled technologies in filter design.

  • Continuously Graded Pore Structure: Effectively removes defective particles without changing size distribution. Provides long service life and high dirt holding capacity.

  • One-piece Construction: Easy to install, clean, and replace.

Types

  • Keevalid: Rolled or melt-blown depth PP medium for CMP, 50 nm–40 µm.

  • Pleavalid: Pleated PP medium filter for CMP, 0.2 µm–5.0 µm.

  • Nylonvalid: Nylon membrane filter for CMP, 50 nm–3.0 µm.

Second Source Filters Supplied for Pall Part Numbers

  • DFA4201FRES

  • DFA6402FDE

  • AB1V0023EYH1

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