CMP Slurry Filtration Solution
CMP Slurry Filtration Solution
Suitable for CMP polishing system in the slurry recirculation / global loop and at point-of-use (POU)
Fetaures
- Nano-fiber Media Multi-layer Nano-fiber media provides high flow rates and dirt holding capacity
- Patent on Filter Construction Design Perfectly integrate depth, pleated and rolled technologies in filter design
- Continuously Graded Pore Structure Effectively removes defective particles with the size distribution unchanged. Provides long service life and high dirt holding capacity.
- One-piece Construction: One-piece construction means it’s easy to install, clean, and replace
Types:
- Keevalid; Rolled or Melt-blown Depth PP Medium for CMP 50nm-40µm
- Pleavalid; Pleated PP Medium Filter for CMP 0.2µm-5.0µm
- Nylonvalid; Nylon Membrane Filter foor CMP 50nm-3.0µm
We supply second source filter to for example the following Pall p/n’s:
- DFA4201FRES
- DFA6402FDE
- AB1V0023EYH1
