CMP Slurry Filtration Solution
CMP Polishing System Filters
Suitable for CMP polishing systems in slurry recirculation/global loop and at point-of-use (POU).
Features
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Nano-fiber Media: Multi-layer nano-fiber media provides high flow rates and dirt holding capacity.
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Patent on Filter Construction Design: Perfectly integrates depth, pleated, and rolled technologies in filter design.
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Continuously Graded Pore Structure: Effectively removes defective particles without changing size distribution. Provides long service life and high dirt holding capacity.
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One-piece Construction: Easy to install, clean, and replace.
Types
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Keevalid: Rolled or melt-blown depth PP medium for CMP, 50 nm–40 µm.
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Pleavalid: Pleated PP medium filter for CMP, 0.2 µm–5.0 µm.
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Nylonvalid: Nylon membrane filter for CMP, 50 nm–3.0 µm.
Second Source Filters Supplied for Pall Part Numbers
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DFA4201FRES
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DFA6402FDE
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AB1V0023EYH1