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Home
Products
White Knight
Boboo Hi Tech
Cobetter Filtration
DS Fibertech
E&IB
GlobalZEUS
JST
Kaijo
KFPI
Mactronix
RF Global Solutions
Rhenium Alloys Inc.
Rite Track
SVCS Process Innovation
Tokico
Truelok
Wooam Super Polymer
YOUNGDO
Processes
Deposition
CVD
PVD
CMP
CMP tools
Photo lithography
Spin Coater
Stepper
Spin Developer
Etching/ Material removal
Dry
Wet
Doping/ thermal
Diffusion
RTP
Implant
Process control
Inspection
Metereolgy
Wafer Handling Sorting
Facilities
Repairs
About
General
Terms & Conditions
Vacancies
Contact us
Single Crystal Ingot Puller 200mm PSG-20
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Single Crystal Ingot Puller 200mm PSG-20
Single Crystal Ingot Puller 200mm PSG-20
Features;
Heating method : graphite resistance heating
Power Supply : S.Heater 150KW, b.Heater 60KW
Equipment : W 2,500 / D 3,500 / H 9,000
Set up & Installation Included
Specifications;
Ingot Diameter: 206mm (8” Wafer)
Pull Chamber Height: 3000mm
Pull Chamber: ID Φ305.5 mm
FurnaceDiameter: ID 1050mm
Wire Dia & Travel Stroke: Φ3.0, 6000mm (MAX : 7000mm)
Seed Lift Speed: 0.1~10mm/min (MAX:1200mm/min)
Position Resolution : 0.001mm/pulse
Seed Rotate Speed: 0~30 RPM
Crucible Travel Stroke: ≥ 600mm (MAX : 650mm)
Crucible Lift Speed: 0.01~1mm/min (MAX : 200mm/min)
Position Resolution : 0.001mm/pulse
Crucible Rotate Speed: 0~10 RPM
Reflector Stroke: 200mm
Hot Zone Dimension: 24”
Charge: 150Kg (MAX. 180Kg)
Chamber Material- Inside : SUS316L, Outside : SUS304
Argon Pressure & Flow: 2~3Kg/Cm2 / MAX Flow 200LPM
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